Atomic Force Microscopy, Scanning Nearfield Optical Microscopy and Nanoscratching : Application to Rough and Natural Surfaces

Making a clear distinction is made between nano- and micro-mechanical testing for physical reasons, this monograph describes the basics and applications of the supermicroscopies AFM and SNOM, and of the nanomechanical testing on rough and technical natural surfaces in the submicron range down to a l...

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Détails bibliographiques
Auteur principal : Kaupp Gerd (Auteur)
Format : Livre
Langue : anglais
Titre complet : Atomic Force Microscopy, Scanning Nearfield Optical Microscopy and Nanoscratching : Application to Rough and Natural Surfaces / by Gerd Kaupp.
Édition : 1st ed. 2006.
Publié : Berlin, Heidelberg : Springer Berlin Heidelberg , [20..]
Cham : Springer Nature
Collection : Nanoscience and technology (Internet)
Accès en ligne : Accès Nantes Université
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Condition d'utilisation et de reproduction : Conditions particulières de réutilisation pour les bénéficiaires des licences nationales : https://www.licencesnationales.fr/springer-nature-ebooks-contrat-licence-ln-2017
Contenu : Atomic Force Microscopy. Scanning Near-Field Optical Microscopy. Nanoindentation. Nanoscratching
Sujets :
Documents associés : Autre format: Atomic force microscopy, scanning nearfield optical microscopy and nanoscratching
Description
Résumé : Making a clear distinction is made between nano- and micro-mechanical testing for physical reasons, this monograph describes the basics and applications of the supermicroscopies AFM and SNOM, and of the nanomechanical testing on rough and technical natural surfaces in the submicron range down to a lateral resolution of a few nm. New or improved instrumentation, new physical laws and unforeseen new applications in all branches of natural sciences (around physics, chemistry, mineralogy, materials science, biology and medicine) and nanotechnology are covered as well as the sources for pitfalls and errors. It outlines the handling of natural and technical samples in relation to those of flat standard samples and emphasizes new special features. Pitfalls and sources of errors are clearly demonstrated as well as their efficient remedy when going from molecularly flat to rough surfaces. The academic or industrial scientist learns how to apply the principles for tackling their scientific or manufacturing tasks that include roughness far away from standard samples
ISBN : 978-3-540-28472-7
DOI : 10.1007/978-3-540-28472-7