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01237cam a2200313 4500 |
| 001 |
PPN016906985 |
| 005 |
20150116014200.0 |
| 010 |
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|a 0-8155-1331-3
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| 020 |
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|a US
|b 934078
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| 035 |
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|a ocm27976222
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| 100 |
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|a 19930402d1993 u y0engy0103 ba
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| 101 |
0 |
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|a eng
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| 102 |
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|a US
|b nj
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| 105 |
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|a a a 001|y
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| 200 |
0 |
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|a Handbook of semiconductor wafer cleaning technology
|e science, technology, and applications
|f edited by Werner Kern
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| 210 |
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|a Park Ridge, N.J., U.S.A.
|c Noyes Publications
|d c1993
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| 215 |
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|a xx, 623 p.
|c ill.
|d 25 cm
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| 225 |
2 |
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|a Materials science and process technology series
|i Electronic materials and process technology
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| 320 |
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|a Includes bibliographical references and index.
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| 410 |
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| |
|0 013735039
|t Materials science and process technology series
|f ed. Rointan F. Bunshah, Gary E. McGuire
|c Park Ridge (N.J.)
|n Noyes publications
|p 24 cm
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| 606 |
|
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|3 PPN027282570
|a Semiconducteurs
|2 rameau
|
| 676 |
|
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|a 621.3815/2
|v 20
|
| 680 |
|
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|a TK7871.85
|b .H335 1993
|
| 702 |
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1 |
|a Kern
|b Werner
|f 1925-
|
| 801 |
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3 |
|a FR
|b Abes
|c 20001223
|g AFNOR
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| 801 |
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1 |
|a US
|b OCLC
|c 20001223
|g AACR2
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| 801 |
|
2 |
|a FR
|b AUROC
|c 20001223
|g AFNOR
|
| 930 |
|
|
|5 441092105:15051249X
|b 441092105
|a 621.381 52 HAN
|j u
|
| 998 |
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|a 60553
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