(untitled) - 19990313d1994 |||||frey0103 ba; ROYER JACQUES
AN XPS STUDY OF THE INTERACTION INDUCED BY ELECTRON BEAM OR NEON ION BEAM BETWEEN ADSORBED MOLECULES OF SF#6 AND MONOCRYSTALLINE SILICON AT LOW TEMPERATURE
Keywords: PHYSIQUE/CHIMIE : ETAT CONDENSE : PROPRIETES MECANIQUES ET THERMIQUES/CHIMIE GENERALE ET PHYSIQUE; ETUDE EXPERIMENTALE/SPECTROMETRIE PHOTOELECTRON/RAYON X/ETAT ADSORBE/SILICIUM/NC/SOUFRE FLUORURE/NK/COMPOSE BINAIRE/EFFET PHYSIQUE RAYONNEMENT/FAISCEAU ELECTRON/DISSOCIATION MOLECULAIRE/CHIMISORPTION/MECANISME/CINETIQUE/GRAVURE PLASMA/FAISCEAU ION/NEON ION/NC/6180F/PAC/8265M/PAC/6180J/PAC/SI/SF6/F S; EXPERIMENTAL STUDY/PHOTOELECTRON SPECTROSCOPY/X RADIATION/ADSORBED STATE/SILICON/NC/SULFUR FLUORIDES/NK/BINARY COMPOUNDS/PHYSICAL RADIATION EFFECTS/ELECTRON BEAMS/MOLECULAR DISSOCIATION/CHEMISORPTION/MECHANISM/KINETICS/PLASMA ETCHING/ION BEAMS/NEON IONS/NC